+Spin dryer

Spin dryer can be used in photolithography process in semiconductor factories, discrete companies, academies labs, wafer size can be 2-8inch.

Clean the wafers after wet etching process. Operator can set up the rotation rate (0-28000RPM) and supply heating N2 (50-70 Degree C) to clean the wafer. No washmarking or particles after the cleaning.

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